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High End Bathroom Vacuum Coating Equipment
  • High End Bathroom Vacuum Coating Equipment
  • High End Bathroom Vacuum Coating Equipment
  • High End Bathroom Vacuum Coating Equipment
High End Bathroom Vacuum Coating EquipmentHigh End Bathroom Vacuum Coating EquipmentHigh End Bathroom Vacuum Coating Equipment

High End Bathroom Vacuum Coating Equipment

This series of machine combines cathode arc ion coating technique, magnetron sputtering technique and pulsed bias technique in one machine. This model has become the main technology of hardware coating.

Product Details

It can run arc system alone, or run magnetron sputtering system alone. These two systems can run at different time according to their advantages to get a perfect coating. For example, at initial stage of coating process, arc system is operated for clean and based coating using its high-energy particle bombardment, to enhance the adhesion between coating and substrates, then run magnetron system to get the coating that is smooth and delicate. This machine can also be equipped with ion sources, which can meet the needs of multi-functional coating.
PRODUCT ADVANTAGE.

High End Bathroom Vacuum Coating Equipment includes the following key Features:

1, Effective: The deposition rate is fast

2, Compact: Small footprint, easy to integrate into the factory

3, Accurate: Accurate control of plating thickness

4, High quality: The film has high purity, good compactness and uniformity

5, Diversification: Mixed sputtering of different metals, alloys and oxides

6, Remote access: Provide factory remote diagnostics


Technical Parameters:

ModelGHIV-1600
SizeФ1600×H1900mm
Coating SystemMulti-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc
Inflation systemMass flowmeter
Power supplyDC magnetron sputtering power supply, MF sputtering power supply, high pressure ion bombard power supply. 
TargetDC magnetic control target, medium frequency twin target, plane target and cylindrical target.
StructureVertical signal door, vertical double doors
Pump systemMolecular pump (diffusion pump) + Roots pump + Mechanical pump+Holding pump (optional: turbo pump,poly cold system) or Cryopump
Air systemMass flow controller(1-4road)
Vacuum Measurement SystemPirani + cold cathode + film gauge
Ultimate Vacuum5 ×104 Pa(no-loading,clean chamber)
Pumping TimeNo-loading from air to 5×103 Pa<13mins
Pressure-keeping rates1h≤0.6pa
Arc Source22 set -28 set
200A-300A
Bias power supply60kW / set
Working rotation mode6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation
Working baking temperatureNormal temperature to 450 ℃ controllable and adjustable (PID temperature control)
Process gasAutomatic filling system for 3 or 4-way process gas flow control and display system
Argon, nitrogen, oxygen, acetylene, etc
Cooling modeWater cooling cycle mode, with industrial cooling tower or industrial chiller (refrigerator) or cryogenic system. (provided by customer)
Control modePLC + touch screen operation or computer control, manual, semi-automatic, automatic mode
Supply indexPressure 0.5-0.8MPa、Water temperature ≤25℃、Hydraulic pressure ≥0.2MPa
Alarm and protectionAlarm for water shortage, over-current, over-voltage, open circuit and other abnormal conditions of pump and target, and implement corresponding protection measures and electrical interlocking function
Total power185-200KW
Output frequencyThe voltage is 380V ± 5%, and the frequency is 50 Hz (it can be configured according to the customer's national electricity standard)
Area35~55㎡
Control modeManual + semi-automatic + Automatic integration/touch screen + PLC
Customized ServiceWelcome to Non-standard and Special requirements,OEM/ODM orders.Customization of inner chamber size, temperature&humidity range,etc.
The technical information will be subjected to change without notice