Tel.: 8615989623158
E-mail: sales@grandetop.com
This series of machine combines cathode arc ion coating technique, magnetron sputtering technique and pulsed bias technique in one machine. This model has become the main technology of hardware coating.
It can run arc system alone, or run magnetron sputtering system alone. These two systems can run at different time according to their advantages to get a perfect coating. For example, at initial stage of coating process, arc system is operated for clean and based coating using its high-energy particle bombardment, to enhance the adhesion between coating and substrates, then run magnetron system to get the coating that is smooth and delicate. This machine can also be equipped with ion sources, which can meet the needs of multi-functional coating.
PRODUCT ADVANTAGE.
High End Bathroom Vacuum Coating Equipment includes the following key Features:
1, Effective: The deposition rate is fast
2, Compact: Small footprint, easy to integrate into the factory
3, Accurate: Accurate control of plating thickness
4, High quality: The film has high purity, good compactness and uniformity
5, Diversification: Mixed sputtering of different metals, alloys and oxides
6, Remote access: Provide factory remote diagnostics
Technical Parameters:
Model | GHIV-1600 |
Size | Ф1600×H1900mm |
Coating System | Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc |
Inflation system | Mass flowmeter |
Power supply | DC magnetron sputtering power supply, MF sputtering power supply, high pressure ion bombard power supply. |
Target | DC magnetic control target, medium frequency twin target, plane target and cylindrical target. |
Structure | Vertical signal door, vertical double doors |
Pump system | Molecular pump (diffusion pump) + Roots pump + Mechanical pump+Holding pump (optional: turbo pump,poly cold system) or Cryopump |
Air system | Mass flow controller(1-4road) |
Vacuum Measurement System | Pirani + cold cathode + film gauge |
Ultimate Vacuum | 5 ×10﹣4 Pa(no-loading,clean chamber) |
Pumping Time | No-loading from air to 5×10﹣3 Pa<13mins |
Pressure-keeping rates | 1h≤0.6pa |
Arc Source | 22 set -28 set |
200A-300A | |
Bias power supply | 60kW / set |
Working rotation mode | 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation |
Working baking temperature | Normal temperature to 450 ℃ controllable and adjustable (PID temperature control) |
Process gas | Automatic filling system for 3 or 4-way process gas flow control and display system |
Argon, nitrogen, oxygen, acetylene, etc | |
Cooling mode | Water cooling cycle mode, with industrial cooling tower or industrial chiller (refrigerator) or cryogenic system. (provided by customer) |
Control mode | PLC + touch screen operation or computer control, manual, semi-automatic, automatic mode |
Supply index | Pressure 0.5-0.8MPa、Water temperature ≤25℃、Hydraulic pressure ≥0.2MPa |
Alarm and protection | Alarm for water shortage, over-current, over-voltage, open circuit and other abnormal conditions of pump and target, and implement corresponding protection measures and electrical interlocking function |
Total power | 185-200KW |
Output frequency | The voltage is 380V ± 5%, and the frequency is 50 Hz (it can be configured according to the customer's national electricity standard) |
Area | 35~55㎡ |
Control mode | Manual + semi-automatic + Automatic integration/touch screen + PLC |
Customized Service | Welcome to Non-standard and Special requirements,OEM/ODM orders.Customization of inner chamber size, temperature&humidity range,etc. |
The technical information will be subjected to change without notice |